AFM-SEM-EDS Correlative Microscopy in Materials Science

Correlative microscopy is not a single method but rather a diverse collection of techniques that share a common approach. By applying multiple microscopy techniques to the same sample, researchers can analyze it across a broader range of magnifications than what a single technique can offer. The integration of Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) into a unified analysis method, along with the necessary instrumentation, is particularly effective for characterizing physical properties at the nanoscale. SEM provides excellent guidance to regions of interest (ROI) and enables material sensitivity using Energy Dispersive Spectroscopy (EDS) X-ray analysis, while AFM complements SEM by offering true quantitative 3D surface data and high spatial resolution. When advanced AFM modes are employed, such as those for electrical, magnetic, and physical properties, AFM-SEM-based analytical workflows become highly relevant for the non-destructive characterization of defects, impurities, and their correlation with performance and reliability.

In this presentation, we will explore the key design elements and workflows enabled by AFM-SEM-EDS systems, demonstrating their significance in materials research, including the study of 2D materials, nanoparticles, magnetic nanorods, Failure Analysis (FA), and semiconductor research. Additionally, we will discuss why the emerging field of AFM-SEM-EDS correlative microscopy allows scientists to study a broader variety of samples, as the complementary strengths of each technique enable the generation of a wider range of nanoscale information.

Speaker: Stefan Spagna, Quantum Design