Vibration mitigation challenges in modern Extreme Ultraviolet tools for semiconductor Applications

Lawrence Berkeley National Laboratory's Center for X-ray Optics (CXRO) works to further science and technology using short wavelength optical systems and techniques. Since the early 2000s, CXRO has worked with semiconductor companies to develop the infrastructure needed for world-leading research and development in the field of EUVL, contributing basic research and development essential to the health of the U.S. industry as a whole before individual firms enter competition.

Two new Extreme Ultraviolet endstations currently designed at CXRO will be presented:

• MET5 will be a unique instrument with twice the effective resolution of the best tools now in commercial use. MET5 and the new wafer-processing facility will allow the development and test of photosensitive materials capable of transferring patterns on the nanoscale,
• SHARP will be the world's most advanced extreme-ultraviolet (EUV) microscope, it will be dedicated to photolithography, the central process in the creation of computer chips.

The stability of those new systems in the projected vibration environment is a challenge. CXRO has experience with vibration mitigation techniques on its current endstations and the status of our investigations on the general strategy of vibration mitigation will be developed.

Speakers: Partick Naulleau, Senajith Rekawa, Arnaud Allezy, LBNL

Room: 102/103